R&D direction:
1) Arf (193 nanometer) photoresist technology: R&D expert/team leader/senior engineer
2) Arf (193 nanometer) photoresist resin: R&D expert/team leader/senior engineer
3) Special monomers (acrylates, epoxy, aromatic ethers, etc.): R&D experts/team leaders/senior engineers.
Recruitment method: Full-time is possible, part-time is also possible, such as professional consultants, scholars, consultants, etc.
Recruitment requirements: Master's degree or above, no age limit, more than 5 years of working experience in photoresist.
Work location: Shanghai, China